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Handbook of Physical Vapor Deposition PVD Processing

Handbook of Physical Vapor Deposition  PVD  Processing
  • Author : D. M. Mattox
  • Publsiher : Cambridge University Press
  • Release : 19 September 2014
  • ISBN : 9780080946580
  • Pages : 944 pages
  • Rating : 5/5 from 1 ratings
GET THIS BOOKHandbook of Physical Vapor Deposition PVD Processing

Summary:
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.


Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
  • Author : D. M. Mattox
  • Publisher : Cambridge University Press
  • Release : 19 September 2014
GET THIS BOOKHandbook of Physical Vapor Deposition (PVD) Processing

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed


Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
  • Author : Donald M. Mattox
  • Publisher : William Andrew
  • Release : 29 April 2010
GET THIS BOOKHandbook of Physical Vapor Deposition (PVD) Processing

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the


Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
  • Author : Donald M. Mattox
  • Publisher : William Andrew
  • Release : 31 December 1998
GET THIS BOOKHandbook of Physical Vapor Deposition (PVD) Processing

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed


Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
  • Author : Donald M. Mattox
  • Publisher : William Andrew
  • Release : 31 December 1998
GET THIS BOOKHandbook of Physical Vapor Deposition (PVD) Processing

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed


Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
  • Author : Donald M. Mattox
  • Publisher : William Andrew
  • Release : 31 December 1998
GET THIS BOOKHandbook of Physical Vapor Deposition (PVD) Processing

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed


The Foundations of Vacuum Coating Technology

The Foundations of Vacuum Coating Technology
  • Author : Donald M. Mattox
  • Publisher : Springer Science & Business Media
  • Release : 26 April 2004
GET THIS BOOKThe Foundations of Vacuum Coating Technology

The Foundations of Vacuum Coating Technology is a concise review of the developments that have led to the wide variety of applications of this technology. This book is a must for materials scientists and engineers working with vacuum coating in the invention of new technologies or applications in all industries. With over 370 references, this is an excellent starting point for those who don’t want to reinvent the wheel. In particular, the book is a valuable reference for those interested


Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions.


Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition
  • Author : Hugh O. Pierson
  • Publisher : William Andrew
  • Release : 02 December 2012
GET THIS BOOKHandbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and


Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
  • Author : Peter M. Martin
  • Publisher : William Andrew
  • Release : 01 December 2009
GET THIS BOOKHandbook of Deposition Technologies for Films and Coatings

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i


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  • Author : Hartmut Frey,Hamid R. Khan
  • Publisher : Springer Science & Business Media
  • Release : 06 May 2015
GET THIS BOOKHandbook of Thin Film Technology

“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology


Advanced Techniques for Surface Engineering

Advanced Techniques for Surface Engineering
  • Author : W. Gissler,H.A. Jehn
  • Publisher : Springer Science & Business Media
  • Release : 31 October 1992
GET THIS BOOKAdvanced Techniques for Surface Engineering

The hardest requirements on a material are in general imposed at the surface: it has to be wear resistant for tools and bearings; corrosion resistant for turbine blades; antireflecting for solar cells; and it must combine several of these properties in other applications. `Surface engineering' is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both the more traditional methods, such as nitriding, boriding and carburizing, and the newer ones,


Thin-Film Deposition: Principles and Practice

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  • Author : Donald L. Smith
  • Publisher : McGraw Hill Professional
  • Release : 22 March 1995
GET THIS BOOKThin-Film Deposition: Principles and Practice

Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application.


Handbook of Deposition Technologies for Films and Coatings

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  • Author : Rointan Framroze Bunshah
  • Publisher : William Andrew
  • Release : 25 February 1994
GET THIS BOOKHandbook of Deposition Technologies for Films and Coatings

This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.


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  • Author : D.M. Dobkin,M.K. Zuraw
  • Publisher : Springer Science & Business Media
  • Release : 09 March 2013
GET THIS BOOKPrinciples of Chemical Vapor Deposition

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many


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  • Author : Nikolay Nikitenkov
  • Publisher : BoD – Books on Demand
  • Release : 08 March 2017
GET THIS BOOKModern Technologies for Creating the Thin-film Systems and Coatings

Development of the thin film and coating technologies (TFCT) made possible the technological revolution in electronics and through it the revolution in IT and communications in the end of the twentieth century. Now, TFCT penetrated in many sectors of human life and industry: biology and medicine; nuclear, fusion, and hydrogen energy; protection against corrosion and hydrogen embrittlement; jet engine; space materials science; and many others. Currently, TFCT along with nanotechnologies is the most promising for the development of almost all