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High Mobility Materials for CMOS Applications

High Mobility Materials for CMOS Applications
  • Author : Nadine Collaert
  • Publisher : Woodhead Publishing
  • Release : 29 June 2018
GET THIS BOOKHigh Mobility Materials for CMOS Applications

High Mobility Materials for CMOS Applications provides a comprehensive overview of recent developments in the field of (Si)Ge and III-V materials and their integration on Si. The book covers material growth and integration on Si, going all the way from device to circuit design. While the book's focus is on digital applications, a number of chapters also address the use of III-V for RF and analog applications, and in optoelectronics. With CMOS technology moving to the 10nm node and

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Reliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications

Reliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications
  • Author : Jacopo Franco,Ben Kaczer,Guido Groeseneken
  • Publisher : Springer Science & Business Media
  • Release : 19 October 2013
GET THIS BOOKReliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications

Due to the ever increasing electric fields in scaled CMOS devices, reliability is becoming a showstopper for further scaled technology nodes. Although several groups have already demonstrated functional Si channel devices with aggressively scaled Equivalent Oxide Thickness (EOT) down to 5Å, a 10 year reliable device operation cannot be guaranteed anymore due to severe Negative Bias Temperature Instability. This book focuses on the reliability of the novel (Si)Ge channel quantum well pMOSFET technology. This technology is being considered for possible implementation

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Interface-engineered Ge MOSFETs for Future High Performance CMOS Applications

Interface-engineered Ge MOSFETs for Future High Performance CMOS Applications
  • Author : Anonim
  • Publisher : Stanford University
  • Release : 16 January 2022
GET THIS BOOKInterface-engineered Ge MOSFETs for Future High Performance CMOS Applications

As the semiconductor industry approaches the limits of traditional silicon CMOS scaling, introduction of performance boosters like novel materials and innovative device structures has become necessary for the future of CMOS. High mobility materials are being considered to replace Si in the channel to achieve higher drive currents and switching speeds. Ge has particularly become of great interest as a channel material, owing to its high bulk hole and electron mobilities. However, replacement of Si channel by Ge requires several

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Graphene and Emerging Materials for Post-CMOS Applications

Graphene and Emerging Materials for Post-CMOS Applications
  • Author : Yaw Obeng
  • Publisher : The Electrochemical Society
  • Release : 01 May 2009
GET THIS BOOKGraphene and Emerging Materials for Post-CMOS Applications

The objectives of this symposium was to address all current and future issues related to ¿Emerging Materials For Post-CMOS Applications.¿ The symposium focused on fundamental material science, characterization and applications of emerging materials designed for alternatives technologies to replace CMOS. Special emphasis was placed on ¿Beyond CMOS¿ integration schemes, technology development and on the impact of non-traditional materials into nanoelectronics.

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Microelectronics, Circuits and Systems

Microelectronics, Circuits and Systems
  • Author : Abhijit Biswas,Raghvendra Saxena,Debashis De
  • Publisher : Springer Nature
  • Release : 03 August 2021
GET THIS BOOKMicroelectronics, Circuits and Systems

This book presents a collection of peer-reviewed articles from the 7th International Conference on Microelectronics, Circuits, and Systems – Micro 2020. The volume covers the latest development and emerging research topics of material sciences, devices, microelectronics, circuits, nanotechnology, system design and testing, simulation, sensors, photovoltaics, optoelectronics, and its different applications. This book also deals with several tools and techniques to match the theme of the conference. It will be a valuable resource for researchers, professionals, Ph.D. scholars, undergraduate and postgraduate students

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Stress and Strain Engineering at Nanoscale in Semiconductor Devices

Stress and Strain Engineering at Nanoscale in Semiconductor Devices
  • Author : Chinmay K. Maiti
  • Publisher : CRC Press
  • Release : 30 June 2021
GET THIS BOOKStress and Strain Engineering at Nanoscale in Semiconductor Devices

Anticipating a limit to the continuous miniaturization (More-Moore), intense research efforts are being made to co-integrate various functionalities (More-than-Moore) in a single chip. Currently, strain engineering is the main technique used to enhance the performance of advanced semiconductor devices. Written from an engineering applications standpoint, this book encompasses broad areas of semiconductor devices involving the design, simulation, and analysis of Si, heterostructure silicongermanium (SiGe), and III-N compound semiconductor devices. The book provides the background and physical insight needed to understand

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Recent Trends in Electronics and Communication

Recent Trends in Electronics and Communication
  • Author : Amit Dhawan,Vijay Shanker Tripathi,Karm Veer Arya,Kshirasagar Naik
  • Publisher : Springer Nature
  • Release : 13 December 2021
GET THIS BOOKRecent Trends in Electronics and Communication

This book comprises select proceedings of the International Conference on VLSI, Communication and Signal processing (VCAS 2020). The contents are broadly divided into three topics – VLSI, Communication, and Signal Processing. The book focuses on the latest innovations, trends, and challenges encountered in the different areas of electronics and communication, especially in the area of microelectronics and VLSI design, communication systems and networks, and image and signal processing. It also offers potential solutions and provides an insight into various emerging areas such

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Frontiers In Electronics: Selected Papers From The Workshop On Frontiers In Electronics 2013 (Wofe-2013)

Frontiers In Electronics: Selected Papers From The Workshop On Frontiers In Electronics 2013 (Wofe-2013)
  • Author : Sorin Cristoloveanu,Michael S Shur
  • Publisher : World Scientific
  • Release : 15 December 2014
GET THIS BOOKFrontiers In Electronics: Selected Papers From The Workshop On Frontiers In Electronics 2013 (Wofe-2013)

This book brings together 11 invited papers from the Workshop on Frontiers in Electronics (WOFE) 2013 that took place at San Juan, Puerto Rico, in December 2013. These articles present the ground-breaking works by world leading experts from CMOS and SOI, to wide-bandgap semiconductor technology, terahertz technology, and bioelectronics.WOFE is a bi-annual gathering of leading researchers from around the world, across multiple disciplines, to share their results and discuss key issues in the future development of microelectronics, photonics, and nanoelectronics.The focus

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Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6

Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6
  • Author : Fred Roozeboom,Paul Timans,Evgeni Gusev,Vijay Narayanan,Kuniyuki Kakushima,Zia Karim,Stefan De Gendt
  • Publisher : The Electrochemical Society
  • Release : 16 January 2022
GET THIS BOOKSilicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6

Advances in GaN, GaAs, SiC and Related Alloys on Silicon Substrates: Volume 1068

Advances in GaN, GaAs, SiC and Related Alloys on Silicon Substrates: Volume 1068
  • Author : Materials Research Society. Meeting Symposium C.
  • Publisher : Materials Research Society
  • Release : 29 August 2008
GET THIS BOOKAdvances in GaN, GaAs, SiC and Related Alloys on Silicon Substrates: Volume 1068

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

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Dielectrics in Nanosystems -and- Graphene, Ge/III-V, Nanowires and Emerging Materials for Post-CMOS Applications 3

This issue of ECS Transactions will cover the following topics in (a) Graphene Material Properties, Preparation, Synthesis and Growth; (b) Metrology and Characterization of Graphene; (c) Graphene Devices and Integration; (d) Graphene Transport and mobility enhancement; (e) Thermal Behavior of Graphene and Graphene Based Devices; (f) Ge & III-V devices for CMOS mobility enhancement; (g) III.V Heterostructures on Si substrates; (h) Nano-wires devices and modeling; (i) Simulation of devices based on Ge, III-V, nano-wires and Graphene; (j) Nanotechnology applications in

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CMOS Past, Present and Future

CMOS Past, Present and Future
  • Author : Henry Radamson,Eddy Simoen,Jun Luo,Chao Zhao
  • Publisher : Woodhead Publishing
  • Release : 03 April 2018
GET THIS BOOKCMOS Past, Present and Future

CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of

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Dielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing

Dielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing
  • Author : D. Misra
  • Publisher : The Electrochemical Society
  • Release : 01 April 2010
GET THIS BOOKDielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing

This issue of ECS Transactions outlines the dielectric issues in all areas of nanosystems including the traditional areas of semiconductor processing and packaging of nanoelectronics. Various other areas, where multifunctional device integration through innovation in design, materials, and processing at the device and system level will lead to new applications of nanosystems, like electronic, optical, magnetic, mechanical, biological, chemical, energy sources, and various types of sensing devices will be included.

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Silicon Compatible Materials, and Technologies for Advanced Integrated Processes, Circuits and Emerging Applications 5

Silicon Compatible Materials, and Technologies for Advanced Integrated Processes, Circuits and Emerging Applications 5
  • Author : F. Roozeboom,V. Narayanan,K. Kakushima,P. J. Timans,E. P. Gusev
  • Publisher : The Electrochemical Society
  • Release : 16 January 2022
GET THIS BOOKSilicon Compatible Materials, and Technologies for Advanced Integrated Processes, Circuits and Emerging Applications 5